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Contact Us GLOBAL Search this site 日本語 中文 Corporate Overview Products and Services Research and Development Sustainability News Corporate Overview Message from the Management Philosophy Quick Guide to JX Advanced Metals Business Segments Corporate Data Organization and Executive Officers Corporate History Operating Sites and Group Companies Long-Term Vision and Medium- to Long-term Business Strategies and Business Targets Purchasing Information Products and Services Search by Category Copper Alloys and Special Steel Products Copper Foil Sputtering Targets Compound Semiconductors and Crystal Materials Metal and Compound Powders Special Ceramic Powders High Purity Metals Surface Treatment Agents Upinorg (high-purity copper sulfate) Electroless UBM Plating Service MoSi2 Heater Shielding Materials Nonferrous Metals and Chemical Products Products Under Development Search by Keyword Semiconductors and Sensors Circuit Boards Assembly Displays Batteries and Energy Additive Manufacturing Connectors Magnetic Devices Electromagnetic Shielding Communications Optics Camera Modules Piezoelectricity Thermal Control Research and Development Our Core Technologies Contributing to Societal Growth and Innovation Initiatives for Co-creation Collaboration in the Group SQUARE LAB Sustainability Sustainability Report Toward Net-Zero CO2 Emissions Activities in Environmental Conservation CSR Purchasing News News Release Trade Fairs and Exhibitions MENU HOME Products and Services Sputtering Targets Sputtering Targets for Flat Panel Displays IZO Sputtering Target for OLED (IR transparent electrode) Sputtering Targets for Flat Panel Displays IZO Sputtering Target for OLED (IR transparent electrode) Features IZO (Indium-Zinc-Oxide) is our proprietary transparent conductive film material, ideal as an electrode material in OLED panels and other next-generation display panels. It has the following advantages for customers. Low resistivity and high transparency in low-temperature deposition Readily adopted on organic substrate or organic layer Low particle levels and nodule-free structure Contributes to reducing maintenance and raising yield Amorphous stability and excellent surface smoothness Enables easy lamination with upper and lower films Excellent etching properties Contributes to current leak protection and shortening of tact time ITO and IZO basic properties compared Target Film resistivity [m&＃937;/cm] Transmittance@550nm [%] Arcing Amorphous stability Film surface roughness Etching rate Ra[nm] Rz[nm] ITO 1.07 77.9 Normal Normal 2.24 34.2 Normal IZO 0.41 83.1 Low Good 0.52 5.2 Fast All data are for as-depo film; low resistivity and transparency are for 55 nm film thickness; surface roughness is for 130 nm thickness. Applications Transparent conductive films Technology and Properties Purity 3N Shapes All sputtering equipment and all sizes can be used, whether for rotary or planar type. Composition Standard zinc oxide concentration 10.7wt% ITO and IZO nodule/arcing performance compared IZO enables particle levels to be minimized due to extremely low arcing as a result of the nodule-free structure. ITO and IZO electrical conductivity and optical properties compared IZO achieves properties superior to ITO in room temperature deposition and low-temperature annealing. XRD pattern IZO film and ITO film IZO enables high-quality film with amorphous stability. TEM image of IZO film IZO enables high-quality film with amorphous stability. IZO enables high-quality film with amorphous stability. ITO and IZO bending properties compared IZO offers superior bendability. 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